Influence of discharge power level on the properties of hydroxyapatite films deposited on Ti6A14V with RF magnetron sputtering. (Q49165508)

From Wikidata
Jump to navigation Jump to search
scientific article published in February 1995
edit
Language Label Description Also known as
English
Influence of discharge power level on the properties of hydroxyapatite films deposited on Ti6A14V with RF magnetron sputtering.
scientific article published in February 1995

    Statements

    Influence of discharge power level on the properties of hydroxyapatite films deposited on Ti6A14V with RF magnetron sputtering. (English)

    Identifiers

     
    edit
      edit
        edit
          edit
            edit
              edit
                edit
                  edit
                    edit