deep reactive-ion etching (Q486936)

From Wikidata

Jump to navigation Jump to search

highly anisotropic etch process

edit

Language	Label	Description	Also known as
English	deep reactive-ion etching	highly anisotropic etch process

Statements

instance of

technology

0 references

subclass of

etching

0 references

part of

semiconductor device fabrication

0 references

related image

BoschProcess JH.jpg
595 × 720; 37 KB

0 references

Bosch process PILLAR.jpg
712 × 484; 219 KB

0 references

Bosch process sidewall.jpg
712 × 484; 203 KB

0 references

Formação grass de alta densidade - Silício negro.png
1,152 × 768; 426 KB

0 references

Image MEB du profil de gravure réalisé par le procédé Bosch.jpg
1,280 × 720; 88 KB

0 references

Identifiers

Encyclopedia of China (Third Edition) ID

443355

0 references

Freebase ID

/m/07dk4j

1 reference

stated in

Freebase Data Dumps

publication date

28 October 2013

Microsoft Academic ID

124634506

0 references

OpenAlex ID

C124634506

1 reference

stated in

OpenAlex

retrieved

26 January 2022

reference URL

https://docs.openalex.org/download-snapshot/snapshot-data-format

Quora topic ID

Deep-Reactive-Ion-Etching

1 reference

stated in

Quora

 

Sitelinks

Wikipedia(8 entries)

edit

• cawiki Gravat d'ions reactius profunds
• dewiki Reaktives Ionentiefenätzen
• enwiki Deep reactive-ion etching
• fawiki حکاکی یون راکتیو عمیق
• frwiki Gravure ionique réactive profonde
• jawiki 深掘りRIE
• ptwiki Corrosão profunda assistida por íons
• svwiki Djup reaktiv jonetsning

Wikibooks(0 entries)

edit

Wikinews(0 entries)

edit

Wikiquote(0 entries)

edit

Wikisource(0 entries)

edit

Wikiversity(0 entries)

edit

Wikivoyage(0 entries)

edit

Wiktionary(0 entries)

edit

Multilingual sites(0 entries)

edit

Retrieved from "https://www.wikidata.org/w/index.php?title=Q486936&oldid=2198143500"