The residual pattern of double thin-film over-etching for the fabrication of continuous patterns with dimensions varying from 50 nm to millimeters over a large area. (Q47775435)
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scientific article published on 11 March 2008
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | The residual pattern of double thin-film over-etching for the fabrication of continuous patterns with dimensions varying from 50 nm to millimeters over a large area. |
scientific article published on 11 March 2008 |
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The residual pattern of double thin-film over-etching for the fabrication of continuous patterns with dimensions varying from 50 nm to millimeters over a large area. (English)
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Long Qing Chen
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Mary B Chan-Park
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Qing Zhang
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11 March 2008
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155301
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