Copper-vapor-assisted chemical vapor deposition for high-quality and metal-free single-layer graphene on amorphous SiO2 substrate (Q43620191)
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| Language | Label | Description | Also known as |
|---|---|---|---|
| English | Copper-vapor-assisted chemical vapor deposition for high-quality and metal-free single-layer graphene on amorphous SiO2 substrate |
scientific article |
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Copper-vapor-assisted chemical vapor deposition for high-quality and metal-free single-layer graphene on amorphous SiO2 substrate (English)
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Hyungki Kim
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Chibeom Park
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Minhyeok Son
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Misun Hong
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Youngwook Kim
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Jun Sung Kim
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Hyun-Joon Shin
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Jaeyoon Baik
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24 July 2013
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