Molecular depth profiling of multilayer structures of organic semiconductor materials by secondary ion mass spectrometry with large argon cluster ion beams. (Q43275970)
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scientific article published in October 2009
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | Molecular depth profiling of multilayer structures of organic semiconductor materials by secondary ion mass spectrometry with large argon cluster ion beams. |
scientific article published in October 2009 |
Statements
Molecular depth profiling of multilayer structures of organic semiconductor materials by secondary ion mass spectrometry with large argon cluster ion beams (English)
Satoshi Ninomiya
Kazuya Ichiki
Yoshihiko Nakata