extreme ultraviolet lithography (Q371965)
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a next-generation lithography technology using an extreme ultraviolet (EUV) wavelength, currently expected to be 13.5 nm.
- EUV lithography
- EUVL
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | extreme ultraviolet lithography |
a next-generation lithography technology using an extreme ultraviolet (EUV) wavelength, currently expected to be 13.5 nm. |
|
Statements
Lithographie EUV.jpg
422 × 417; 51 KB
422 × 417; 51 KB
La technologie EUV (Extreme UltraViolet) avec masques en reflexion permet une finesse de gravure de 45 nm (source: Nanocomputers and Swarm Intelligence, Jean-Baptiste Waldner, ISTE, London, 2007) (French)
Extreme Ultra-violet (EUV) technology with reflection masks permits lithography of 45nm features (source: Nanocomputers and Swarm Intelligence, Jean-Baptiste Waldner, ISTE, London, 2007) (English)
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EUV (English)
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Extreme ultraviolet lithography
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Wikipedia(14 entries)
- arwiki الأشعة فوق البنفسجية المتطرفة
- cawiki Fotolitografia ultraviolada extrema (electrònica)
- dewiki EUV-Lithografie
- enwiki Extreme ultraviolet lithography
- eswiki Litografía ultravioleta extrema
- fawiki لیتوگرافی فرابنفش فرین
- frwiki Lithographie extrême ultraviolet
- idwiki Litografi ultraviolet ekstrim
- itwiki Litografia ultravioletta estrema
- jawiki 極端紫外線リソグラフィ
- kowiki 극자외선 리소그래피
- ruwiki Фотолитография в глубоком ультрафиолете
- wuuwiki 极紫外光刻
- zhwiki 极紫外光刻
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Multilingual sites(1 entry)
- commonswiki Category:Extreme ultraviolet lithography